http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100018585-A

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filingDate 2008-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a78e8c9702c46e3037dbb7004d6e927d
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publicationDate 2010-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20100018585-A
titleOfInvention Vacuum processing apparatus and vacuum processing method
abstract The present invention relates to a vacuum treatment unit and a vacuum treatment process for performing a plasma process, wherein the treatment can be electrically connected to the cathode via a cathode 10 and an arc generator. A device for producing an electrical low voltage arc discharge 15 (LVAD) comprising an anode 13 and a workpiece support for receiving and moving the workpieces 2, which may be electrically connected to the bias generator 16. support 7) and one or more feed lines 8 for inert and / or active gases are performed in the vacuum chamber 1. Here, at least a part of the surface of the anode is made of graphite and operated at high temperature.n n n n Low Voltage Arc Discharge, Graphite, Bias Generators, Workpieces, Vacuum Processing Equipment
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180055043-A
priorityDate 2007-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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