| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate |
2008-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6921135895ff72eaffe4af7e50671f9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dce12e5c8e0542309a39eb8a726b9d29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7336f7001b3f013cf2e9447a528afd0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07400b7e3c162392702519726272450f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_642e6c1d9368f1e4a8c9a6ea48254426 |
| publicationDate |
2010-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20100009548-A |
| titleOfInvention |
The photosensitive resin composition, the photosensitive element, the formation method of a resist pattern, and the manufacturing method of a printed wiring board |
| abstract |
The photosensitive resin composition of this invention is a photoinitiator containing the (A) acid-modified vinyl-group containing epoxy resin, the compound which has the (B) oxime ester bond, and (C) the coumarin compound represented by following General formula (1) It will contain a sensitizer comprising a.n n n [Formula 1] |
| priorityDate |
2007-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |