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publicationDate 2009-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20090012823-A
titleOfInvention Mold film composition for pattern formation and mold film for pattern formation produced thereby
abstract The present invention is based on 100 parts by weight of the total composition, 30 to 70 parts by weight of each of a polyester-based reactive oligomer, silicone-based reactive oligomer, acrylic reactive oligomer and epoxy acrylate oligomer or at least two or more selected reactive oligomers thereof, at least in the molecule Provided are a mold film composition for pattern formation comprising 30 to 70 parts by weight of a monofunctional or polyfunctional monomer having one unsaturated group, and 1 to 10 parts by weight of a photoinitiator, and a mold film for pattern formation prepared thereby.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102297307-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150045310-A
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