abstract |
The present invention is based on 100 parts by weight of the total composition, 30 to 70 parts by weight of each of a polyester-based reactive oligomer, silicone-based reactive oligomer, acrylic reactive oligomer and epoxy acrylate oligomer or at least two or more selected reactive oligomers thereof, at least in the molecule Provided are a mold film composition for pattern formation comprising 30 to 70 parts by weight of a monofunctional or polyfunctional monomer having one unsaturated group, and 1 to 10 parts by weight of a photoinitiator, and a mold film for pattern formation prepared thereby. |