| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2007-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5d665bd41f0077b9a7096ef836b9521
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71c2eea8d7283a422ebbb66d92f23c11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9700d5fda14a161249a2b7383797e0cf |
| publicationDate |
2008-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20080053239-A |
| titleOfInvention |
2-step etching of bottom antireflective coating in dual damascene applications |
| abstract |
In the present invention, a method of removing a BARC layer from a feature is provided. In one embodiment, the method includes providing a substrate having a feature filled with a BARC layer in an etching chamber, the first gas comprising NH 3 into the chamber to etch a first portion of the BARC layer filled with the feature. Supplying the mixture, and supplying a second gas mixture comprising O 2 gas into the etching chamber to etch the remaining portion of the BARC layer disposed in the feature. |
| priorityDate |
2006-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |