http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070056073-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
| filingDate | 2005-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bddc308df8291d1e7fa4410510806de http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5b7a149c361839c35b42ecc750a84c3 |
| publicationDate | 2007-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070056073-A |
| titleOfInvention | Polymer composition containing a repeating unit having a 2-oxacyclocyclo [4.2.1.04,8] nonan-3-one ring, and a resin composition for a photoresist |
| abstract | The present invention relates to a polymer compound comprising at least one monomer unit represented by the following general formula (I).n n n n n n n n (Wherein R a represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms or a haloalkyl group having 1 to 6 carbon atoms. R 1 and R 2 are the same or different and represent a hydrogen atom or a hydrocarbon group. R 1, R one or more of the 2 is a hydrocarbon group. R 1 and R 2 may form a ring with the carbon atom adjacent to bond to one another. R 3, R 4, R 5, R 6, R 7, R 8 and R 9 are the same or different and represent a hydrogen atom or a hydrocarbon group.)n n n Such high molecular compounds are useful as constituent monomers of the photoresist resin.n n n 2-oxatricyclo [4.2.1.04,8] nonan-3-one rings, repeating units, resins for photoresists, semiconductors |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101234129-B1 |
| priorityDate | 2004-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 161.