| abstract |
In the plasma processing apparatus 100, an upper plate 60 and a lower plate 61 are provided above the susceptor 2. The upper plate 60 and the lower plate 61 are made of a heat resistant insulator such as quartz, are spaced apart from each other in parallel at a predetermined interval, for example, 5 mm, and have a plurality of through holes 60a or 61a. have. It is formed by shifting a position so that the through hole 61a of the lower plate 61 and the through hole 60a of the upper plate 60 may not overlap in the state which overlapped two plates. |