http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20070038346-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_799858790a0d932d2bf525d1f2324ad6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2005-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_072a699253000a7f0d38a778404a8f18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f21db826a941af36f091cf2a71e4b5c |
| publicationDate | 2007-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20070038346-A |
| titleOfInvention | Focus ring of semiconductor manufacturing device |
| abstract | BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a focus ring of a semiconductor manufacturing apparatus, and has a generally annular shape so as to be disposed at an outer portion of a wafer, and includes a portion having a plurality of protrusions of a predetermined shape and having an enlarged surface area compared to other portions. do. According to the present invention, a protrusion having a cylindrical or any other shape is formed on a part of the upper surface of the focus ring, thereby increasing the surface area in contact with the fluorine radical. Therefore, the concentration of fluorine radicals can be effectively lowered, thereby improving the problem of isotropic etching of the outer edge of the wafer, thereby improving the etching uniformity of the entire wafer.n n n n Semiconductor, Plasma, Dry Etching, Focus Ring |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160124429-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210003709-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220149760-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220008393-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111312630-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190137763-A |
| priorityDate | 2005-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559562 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14917 |
Total number of triples: 21.