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filingDate 2005-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2007-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20070003991-A
titleOfInvention Transistors and manufacturing methods thereof
abstract The transistor according to the present invention includes a gate electrode formed on a gate dielectric layer formed on a substrate. A pair of source / drain regions are formed in the substrate on both sides of the transversely opposite sidewall of the gate electrode. The gate electrode includes a pair of sidewall portions overlapping portions of the source / drain regions and a central portion formed on the gate dielectric layer on the substrate region between the source region and the drain region, the central portion having a first work function, The pair of sidewall portions have a second work function, and the second work function is different from the first work function.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9281372-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170059976-A
priorityDate 2004-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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