| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 |
| filingDate |
2004-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c54b8bee1dbdeb42d0cfe9a246d4ffa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfba0211aafaddf8d9dd2afb0d7f744c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54f2b83a4e621366fedf43b1eb84c17f |
| publicationDate |
2006-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20060064569-A |
| titleOfInvention |
Plasma generation method, cleaning method and substrate processing method |
| abstract |
The present invention relates to a plasma generating method in a toroidal plasma generating apparatus including a gas passage having a gas inlet and a gas outlet and forming a main circuit, and a coil wound around a portion of the gas passage. the Ar gas and NF 3 containing NF 3 Supplying a mixed gas of gas and driving the coil by high frequency power to ignite the plasma, wherein the plasma ignition step is performed under a total pressure of 6.65 to 66.5 Pa. |
| priorityDate |
2003-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |