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publicationDate 2006-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20060052457-A
titleOfInvention Method for manufacturing semiconductor device
abstract A mask material forming step of forming a mask material on a substrate; a concave part forming step of patterning the mask material in a predetermined shape to form a concave part in the mask material; a positioning step of arranging a functional liquid in the concave part; A step of drying the functional liquid disposed in the concave portion; an annealing (baking) of a functional film formed by the drying step; and a step of removing the mask material to form a dummy gate pattern made of the constituent material of the functional liquid And a pattern forming step of forming a pattern.
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