| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00432
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00637
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00626
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00659
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-00722 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-54353
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-543
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-00 |
| filingDate |
2004-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b42ea05e822a737344853434af11ddff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_224ad91782b7d0fb914016761ce6828e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46c59e677d124fd9ed3a64ca4a37b824 |
| publicationDate |
2005-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20050114889-A |
| titleOfInvention |
A method of producing a substrate having a patterned organosilane layer and a method of using the substrate produced by the method |
| abstract |
The present invention comprises the steps of (a) coating the organosilane on the substrate to obtain a substrate coated with the organosilane layer; (b) coating a photoresist material on the organosilane layer; (c) patterning the photoresist material to obtain a patterned photoresist material surface; (d) removing the photoresist material in the area exposed to light or the area not exposed to light using a developer; And (e) etching the organosilane layer in the region where the photoresist material has been removed by wet etching using a solution containing HF as an etchant. And it provides a method of using a substrate produced by the above method. |
| priorityDate |
2004-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |