http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20050110548-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49d3fde56eaffc7d8cf533e8d56b59aa
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3255
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2004-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_367e1adb1419a04f070b360ccde1ab0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b81dedbb4dc5caed73d65edfbcd4b03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7dee918f1de870d16211e138d02061e
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publicationDate 2005-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20050110548-A
titleOfInvention Triple plasma generator for simulation and diagnostics of semiconductor processing, nuclear fusion and space plasmas
abstract The present invention relates to a triple plasma generating apparatus for the development and calibration of semiconductor processing, fusion, space plasma simulation and diagnostic apparatus that generates plasma of various densities used in semiconductor manufacturing processes, new materials and materials processing processes, and fusion devices in one device. More specifically, the diagnostic apparatus used in each case by generating a plasma of various densities used in the semiconductor manufacturing process, new materials and materials processing process, the boundary region of the fusion device, or the space plasma around the earth In addition to developing and calibrating the process, we are also concerned with how to simulate each process. The plasma generator using the triple plasma (LaB 6 , helicon, grid) source of the present invention can implement a plasma having various characteristics in the same chamber by using a high density plasma having fluctuations by RF and a static plasma by DC. In particular, the two chambers can be moved on the rails, thereby allowing the attachment of various sources and the diversification of the process. Therefore, the conventional plasma generator has the effect of overcoming the disadvantage that it is not possible to generate plasma of various characteristics using only a single plasma source, and it takes a long time to replace the source when the source is damaged.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9281176-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9960011-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105551531-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105551531-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013055056-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101246191-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103843465-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9734990-B2
priorityDate 2004-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.