http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-200409518-Y1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3222 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2005-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2006-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2006-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-200409518-Y1 |
| titleOfInvention | Internal Antenna for Substrate Processing Chamber |
| abstract | The antenna for coupling energy to the plasma in the process chamber with the wall includes a coil having a surface exposed to the plasma in the chamber. The plurality of standoffs support the coils at set intervals from the walls of the process chamber, and the at least one standoff includes terminals that allow power to be applied to the coils from an external power source. The terminal comprises a conductor receptacle having a first length L 1 and a jacket around the conductor receptacle, the jacket having a second length L 2 . The length L 1 is greater than the length L 2 . The conductor cup is provided around the standoff with the terminals. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9315900-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013112303-A1 |
| priorityDate | 2005-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.