| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31533 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-4068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D165-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D171-00 |
| filingDate |
2002-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e9c07f550c570b8daf40567a264d035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07e51afdf7d05bd6286bcdce8196bfd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee50e65447e045d4dacda0c23cbbbf7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dda10a0dfb0879bc0808df5632c0e25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cdc5676007ef9b809bd4bbc90547924 |
| publicationDate |
2003-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20030027827-A |
| titleOfInvention |
Stacked Film, Insulating Film and Semiconductor Substrate |
| abstract |
The present invention can provide a semiconductor laminate film having excellent adhesion to a coating film formed by chemical vapor deposition (CVD) in a semiconductor device or the like.n n n The present invention relates to a hydrolysis condensation product obtained by hydrolysis and condensation of (A) an organic compound film having a carbon content of not less than 60% by weight and (B) at least one compound selected from the group consisting of compounds represented by the following formulas Is laminated by heating the laminated film.n n n n n HSi (OR 51 ) 3 n n n n n (In the formula, R 1 represents a monovalent organic group.)n n n n n R a ' Si (OR 52 ) 4-a' n n n n n (Wherein R represents a fluorine atom or a monovalent organic group, R 52 represents a monovalent organic group, and a 'represents an integer of 1 to 2.)n n n n n Si (OR < 53 >) 4 n n n n n (In the formula, R 53 represents a monovalent organic group.)n n n n n R 54 b ' (R 55 O) 3-b' Si- (R 58 ) d ' -Si (OR 56 ) 3-c' R 57 c ' n n n n n (Wherein R 54 to R 57 are each a monovalent organic group and are the same or different,n n n b 'and c' are integers of 0 to 2, which are the same or different,n n n R 58 is an oxygen atom, a phenylene group or a group represented by - (CH 2 ) n ' - (wherein n' is an integer of 1 to 6)n n n d 'represents 0 or 1.) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10196197-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10839635-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10526131-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100758892-B1 |
| priorityDate |
2001-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |