Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-402 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32596 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-448 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate |
2000-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2002-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20020070436-A |
titleOfInvention |
System and method for depositing inorganic/organic dielectric films |
abstract |
A system and method are provided for depositing a dielectric film on a substrate surface having a processing chamber having a substrate support for supporting a substrate and at least one gas inlet for transporting gas to the processing chamber. A first plasma source for forming a first plasma region in the chamber and a second plasma source for forming a second plasma region in the chamber are provided. Gases are individually ionized to different ionization degrees in the first and second plasma regions, and these individually ionized gases react to form a dielectric film on the substrate surface. |
priorityDate |
1999-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |