http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020027567-A

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0212
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
filingDate 2000-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2002-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20020027567-A
titleOfInvention Method of etching
abstract An object of the present invention is to provide an etching method capable of preventing micro trenching without using an etching stopper. The present invention provides a method for etching an organic film layer formed on a wafer (W) disposed in a processing chamber by introducing a processing gas into an airtight processing chamber, wherein the processing gas includes N 2 and H 2 , and the internal pressure of the vacuum processing chamber is substantially It is characterized in that the 500mTorr to 800mTorr. If at least a nitrogen atom-containing gas and a hydrogen atom-containing gas are included in the processing gas and the pressure inside the vacuum processing chamber is substantially 500 mTorr or more, micro trenching can be prevented without using an etching stopper. In addition, the mask selectivity can be increased.
priorityDate 1999-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457444288
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451

Total number of triples: 21.