| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2001-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd8ad4f4ee86ce1f784859c131499d4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7667383be1d5485400f876d4738a703 |
| publicationDate |
2001-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20010089143-A |
| titleOfInvention |
Chemically amplified positive resist composition |
| abstract |
The present invention,n n n Excellent substrate adhesion;n n n It is possible to provide a resist film excellent in various resist performance characteristics such as dry etching resistance, sensitivity and resolution;n n n Alkali insoluble or poorly soluble in itself but becomes alkali soluble due to the action of acid and the polymerization unit (a) and the lactone ring derived from 3-hydroxy-1-adamantyl (meth) acrylate are selective by alkyl Resin (X) having polymerized units (b) derived from β- (meth) acryloyloxy-γ-butyrolactone which may be substituted with; And a chemically amplified positive resist composition comprising an acid generator (Y). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100489312-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030034292-A |
| priorityDate |
2000-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |