| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S156-914 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32467 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate |
1999-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2001-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20010072092-A |
| titleOfInvention |
A ceramic composition for an apparatus and method for processing a substrate |
| abstract |
A ceramic composite for a process kit and a dielectric window of a reaction chamber in which a substrate is processed in a plasma of a process gas is disclosed. Ceramic composites include ceramic compounds (eg, Al 2 O 3 ) and oxides of Group 3B metals (Y 2 O 3 ). A method of treating (eg, etching) a substrate in a chamber that includes a plasma of process gas is disclosed. The method includes passing processing powder through a dielectric window formed from a ceramic composite. |
| priorityDate |
1998-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |