http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20010051571-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_950bce8d103dab1bd282965fde47f9f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F24D9-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F24D9-00 |
| filingDate | 2000-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_938cdff33b219c27106f8b28857b3a76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_232921cfe767723be1a1a87e9dec1e77 |
| publicationDate | 2001-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20010051571-A |
| titleOfInvention | Zone controlled radiant heating system utilizing focused reflector |
| abstract | The temperature control system 20, 22, 24 is provided to the plasma processing apparatus 10. The plasma processing apparatus 10 includes a plasma generator 14 and a processing chamber 52 which communicates with the plasma generator 14 to allow plasma within the generator to pass into the chamber and react with the surface of the substrate 18 therein. . The temperature control system 20, 22, 24 comprises a plurality of radiant heating elements 58, each of which is disposed in a plurality of regions an at least one heating element, and radiates from the heating element toward the substrate. A radiant heater assembly (20) for heating the substrate (18) having a focus reflector (56) for focusing energy; A feedback mechanism 24 for providing a substrate temperature feedback signal 25; And a controller 22 including a P-I-D closed loop controller 80 and a lamp power controller 90. The P-I-D closed loop controller 80 receives the temperature set point signal and the temperature feedback signal, and in response, independently adjusts the control variables sent to the lamp power controller. The power controller 90 then adjusts the power supplied to the multiple regions of the radiant heating element independently of the control variable, based on the temperature zone map stored in the processor memory. The power controller operates in at least a first lamp state and a second normal state, depending on the magnitude of the difference Δ between the temperature set point signal and the temperature feedback signal. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I560301-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013162797-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10504719-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009099720-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10903067-B2 |
| priorityDate | 1999-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.