| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2000-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_947cec2922a3d05f736fc94a497a76b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9dcf55e6de229f09da42ee5f92216c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09494e55dc0635a8155d0da33831b7be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_194fb83a2dd5bbc4e35eb2fe5208a2ce |
| publicationDate |
2001-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20010020758-A |
| titleOfInvention |
Selective dry etch of a dielectric film |
| abstract |
The present invention relates to a method of etching with high selectivity an oxide layer covering a nitride layer of a substrate. The method includes a plasma etching process for etching the oxide layer of the substrate with carbon and fluorine containing gas and nitrogen containing gas. Si x N y species are formed, which are deposited on the nitride layer while substantially equilibrating with the etching of the nitride layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100630978-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6849539-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101042951-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180013745-A |
| priorityDate |
1999-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |