| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F32-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D471-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2000-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2000-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20000076533-A |
| titleOfInvention |
Resist composition |
| abstract |
(a) two or more polymers that are alkali-soluble by the action of an acid, (b) a combination of an alkylsulfonyl diazomethane compound with a triarylsulfonium arylsulfonate compound or a diarylyodonium arylsulfonate compound The resist composition consisting of a (photoacid) generator, and (c) a solvent is chemically capable of obtaining excellent pattern shape and very fine line and space (L & S), especially when exposed to light having a wavelength of 300 nm or less. It is excellent as an amplified resist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101026948-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100483371-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100863984-B1 |
| priorityDate |
1999-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |