http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000016386-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T279-23 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67748 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 1997-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_147b12bf16511c92b84718c3b440241a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9bbc8f612c040765a151051be720156e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fabc6b3566b56c90881e0ec1d5d72bbb |
| publicationDate | 2000-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20000016386-A |
| titleOfInvention | High flow vacuum chamber with equipment modules such as plasma generating source, vacuum pump device and / or cantilevered substrate support |
| abstract | A vacuum processing chamber is disclosed having a substrate support removably mounted therein. The chamber has an opening in its sidewall and the opening is wide enough to remove the substrate support from the chamber through the opening. The modular mounting device extends through the opening and removably supports the substrate support in the interior of the chamber at a point located inwardly of the interior sidewall of the chamber. The mounting device has a mounting flange and a support arm. The mounting flange is attached to the outer surface of the chamber and the support arm extends between the substrate support and the mounting flange. The chamber has a single vacuum port in the central portion of the end wall of the chamber spaced from the substrate support. The vacuum port is connected to a vacuum pump, which removes gas from the interior of the chamber to maintain the chamber at subatmospheric pressure. The substrate support can be removed through the sidewalls of the chamber for easy inspection or replacement. The substrate support mounted on the side wall also allows a large vacuum port to be located in the end wall of the chamber, thereby connecting the vacuum port to a large capacity vacuum pump so that high flow can be achieved. The chamber also has a modular liner, a modular plasma generating source, and modular vacuum pump devices, each of which can be replaced with interchangeable equipment. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100950987-B1 |
| priorityDate | 1996-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 |
Total number of triples: 28.