| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1999-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1999-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-19990083370-A |
| titleOfInvention |
Positive photosensitive resin composition |
| abstract |
The present invention has a polymer (A) which has an alicyclic hydrocarbon structure and can be dissolved in an alkali by decomposition under the action of an acid, a compound (B) which generates an acid when irradiated with actinic radiation, and a basic compound containing nitrogen ( C) and the positive photosensitive resin composition containing at least one (D) of a fluorine-containing surfactant and a silicone-containing surfactant. When solvent (E) is a combination of specific solvents, the composition may exhibit better properties. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100546110-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100773336-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100720500-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100795404-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101390709-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100795109-B1 |
| priorityDate |
1998-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |