Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2002-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2007-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-100773336-B1 |
titleOfInvention |
Positive photoresist composition |
abstract |
Acid-decomposable resins containing specific repeating units; Acid generators; And a positive dissolution inhibiting compound. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100064338-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101715393-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101780156-B1 |
priorityDate |
2001-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |