| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3174 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
1997-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
1998-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-19980064271-A |
| titleOfInvention |
Improved Etching of Focused Ion Beams Using 1,2 Di-iodo-ethane |
| abstract |
A focused ion beam is used to etch the material from the specimen while directing the vapor of 1,2 di-iodo-ethane at the surface being etched. The etch rate is accelerated relative to the surface of the aluminum and gold in relation to the etch rate without using 1,2 di-iodo-ethane. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100590575-B1 |
| priorityDate |
1996-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |