http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980048092-A
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-00 |
filingDate | 1996-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1998-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-19980048092-A |
titleOfInvention | Capacitor and manufacturing method thereof |
abstract | The present invention provides a capacitor in which the lower electrode is formed of platinum (Pt) (Ru, RuO 2 ), etc., in order to constitute a material having a low step structure and an improved capacitance, and in the process of manufacturing such a capacitor, A method of manufacturing a capacitor in which a polymer generated in a process of etching platinum (Pt) can be completely removed. The capacitor manufacturing process includes the steps of: forming a first metal plug in a contact hole; Depositing a second metal and platinum (Pt) in sequence; Patterning the platinum film (Pt) and the second metal film, and forming a capacitor dielectric film on the high dielectric material thereon; In the capacitor manufacturing process comprising forming an upper electrode with a predetermined fourth metal thereon, the step of patterning the platinum film Pt and the second metal film includes a silicon nitride film Si on the platinum film Pt. 3 N 4 ) and then patterning the silicon nitride film by photolithography and etching; Etching the platinum film Pt and the second metal film using the patterned silicon nitride film as a mask; Making the polymer produced in the etching process for the platinum film Pt and the second metal film soft; Selectively etching the silicon nitride film; Removing the softened polymer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100513363-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020052482-A |
priorityDate | 1996-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.