http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19980026718-A
Outgoing Links
Predicate | Object |
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classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
filingDate | 1996-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 1998-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-19980026718-A |
titleOfInvention | Organic Anti-reflective Film (ARC) Etching Method |
abstract | The present invention relates to a method for manufacturing a semiconductor device, and to provide an organic anti-reflection film etching method suitable for minimizing loss of the photoresist film and improving anisotropic etching profile during organic anti-reflection film etching.n n n The organic anti-reflective coating method of the present invention for this purpose is to form an organic anti-reflective coating on the etching layer, the step of coating and patterning a photosensitive material on the organic anti-reflective coating and etching the organic anti-reflective coating in an O 2 / CO plasma atmosphere It is made, including. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100400251-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100374958-B1 |
priorityDate | 1996-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 |
Total number of triples: 21.