Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2021-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2023-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2023-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102489934-B1 |
titleOfInvention |
Etching treatment device and etching treatment method |
abstract |
According to an embodiment of the present invention, an etching treatment apparatus and etching treatment using liquid fluorocarbon or liquid hydrofluorocarbon precursor capable of achieving almost the same effect as cryogenic etching even at a relatively high temperature compared to cryogenic etching A method may be provided. In addition, an etching treatment apparatus and an etching treatment method capable of solving process problems that may occur due to a liquid precursor and a low temperature may be provided. |
priorityDate |
2021-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |