| abstract |
Step A of forming a first resist pattern on a support, step B of applying a basic composition to cover the first resist pattern, neutralizing the base in the basic composition and the first resist pattern, and the surface of the first resist pattern step C of forming a developer-insoluble region and step D of developing the coated first resist pattern, wherein the basic composition contains a basic component, and the basic component is a constituent unit represented by the general formula (x0-1) A method of forming a resist pattern comprising a high molecular compound having (x0). [R; H, C 1-5 alkyl group, C 1-5 halogenated alkyl group. Vx 01 ; A divalent hydrocarbon group having an ether bond or an amide bond, a divalent aromatic hydrocarbon group, Yx 01 ; a single bond, a divalent linking group, Rx 1 ; a substituent having a nitrogen atom.] [Formula 1] |