http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102364322-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate | 2015-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102364322-B1 |
| titleOfInvention | Etching method |
| abstract | An object of the present invention is to selectively etch a region made of silicon oxide without reducing throughput. A method of selectively etching the oxide layer from a target object having an oxide layer made of silicon oxide in a processing vessel of a plasma processing apparatus is provided. This method comprises the steps of: (a) generating a plasma of a gas containing hydrogen, nitrogen, and fluorine in a processing vessel, and modifying the oxide layer to form an altered layer; (b) forming the altered layer After the process, a process of removing the altered layer by irradiating secondary electrons to the object to be processed in the processing container, generating plasma with positive ions in the processing container, and applying a negative DC voltage to the upper electrode of the plasma processing apparatus , causing positive ions to collide with the upper electrode, thereby emitting secondary electrons from the upper electrode. |
| priorityDate | 2014-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.