http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102311939-B1

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filingDate 2021-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1165185185c12580361ad9966b32076f
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publicationDate 2021-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102311939-B1
titleOfInvention Apparatus for multi trapping of reaction by-product for semiconductor process
abstract The present invention relates to an apparatus for collecting multiple reaction by-products for a semiconductor process, wherein a mixed reaction by-product contained in a gas discharged after performing a process of multiple deposition of different thin film layers in a process chamber during a semiconductor manufacturing process is vertically separated by a distance from a heater Reaction by-products aggregated in the form of a thin film in the relatively high temperature region through the first collecting unit in the upper region so that the collecting area is separated through the flow path direction change using the temperature distribution difference and the collecting structure and the multiple vortex generating structure is collected in one collecting device. A feature of the invention is a multi-reaction by-product collecting device for a semiconductor process configured to collect the reaction by-products that are aggregated in a powder form in a relatively low temperature region through the second collecting unit in the lower region.
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