patent/KR-102304823-B1

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102304823-B1

Outgoing Links

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classificationCPCAdditional	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-335
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classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate	2017-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	2021-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate	2021-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	KR-102304823-B1
titleOfInvention	Controlling Dry Etching Process Characteristics Using Waferless Dry Cleaning Light Emission Spectroscopy
abstract	An architecture, platform, and platform for acquiring light emission spectra from a light emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of a plasma processing system and igniting a plasma in the plasma processing chamber to initiate a waferless dry cleaning process and methods are described.
priorityDate	2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate	Subject
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100881045-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101445153-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007238199-A1
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694

Total number of triples: 41.