http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102285531-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2014-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2021-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102285531-B1 |
titleOfInvention | Chemically amplified positive-type photosensitive resin composition and method for producing resist pattern using the same |
abstract | assignment Provided are a chemically amplified positive-type photosensitive resin composition having excellent contrast and high sensitivity, and a method for producing a resist pattern using the same. solution The chemically amplified positive photosensitive resin composition according to the present invention is represented by the following formula (1), a compound having a melting point of 40° C. or less at 1 atm, and a resin whose solubility in alkali is increased by the action of an acid; Contains a photoacid generator. In the formula, R 1 represents a hydrogen atom or an organic group, R 2 , R 3 and R 4 independently represent a monovalent hydrocarbon group which may have a substituent, and at least two of R 2 , R 3 and R 4 are bonded to each other. to form a cyclic structure. |
priorityDate | 2013-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 392.