| abstract |
(57) [Problem] To provide a positive photoresist composition for deep ultraviolet exposure in which the depth of focus is increased and foreign matter on a resist pattern is improved. SOLUTION: A compound which generates an acid upon irradiation with actinic rays or radiation, a resin which is insoluble or hardly soluble in alkali, decomposes by the action of an acid to increase solubility in an alkali developing solution, and a specific structure A positive photoresist composition comprising a compound represented by the formula: |