http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102247560-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2014-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-102247560-B1
titleOfInvention Plasma generating method in RPS(Remote Plasma Source) and method for fabricating semiconductor device comprising the same plasma generating method
abstract The technical idea of the present invention provides a method of generating a plasma capable of improving selectivity in an etching process and minimizing damage to a film quality, and a method of manufacturing a semiconductor device including the method. The plasma generation method is to supply at least one first process gas to a first RPS (Remote Plasma Source), and apply a first energy having a first power at a first duty ratio to generate a first plasma. Generating a; And supplying at least one second process gas to the second RPS and applying second energy having a second power at a second duty ratio to generate a second plasma.
priorityDate 2014-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014099794-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069

Total number of triples: 20.