http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102247560-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate | 2014-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2021-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102247560-B1 |
titleOfInvention | Plasma generating method in RPS(Remote Plasma Source) and method for fabricating semiconductor device comprising the same plasma generating method |
abstract | The technical idea of the present invention provides a method of generating a plasma capable of improving selectivity in an etching process and minimizing damage to a film quality, and a method of manufacturing a semiconductor device including the method. The plasma generation method is to supply at least one first process gas to a first RPS (Remote Plasma Source), and apply a first energy having a first power at a first duty ratio to generate a first plasma. Generating a; And supplying at least one second process gas to the second RPS and applying second energy having a second power at a second duty ratio to generate a second plasma. |
priorityDate | 2014-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
---|---|
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014099794-A1 |
isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069 |
Total number of triples: 20.