http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102195139-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-27 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02175 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02219 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02172 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2020-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102195139-B1 |
| titleOfInvention | Methods of manufacturing semiconductor devices |
| abstract | In a method of manufacturing a semiconductor device, a substrate is loaded into a deposition chamber. A preliminary precursor film is formed by supplying a preliminary precursor flow on the substrate. A precursor flow and a first oxidant flow are supplied on the preliminary precursor film to alternately and repeatedly form a precursor layer and a first oxidant layer. A second oxidant layer is formed by supplying a second oxidant flow on the precursor layer or the first oxidant layer. By forming a preliminary precursor film in advance, it is possible to prevent damage to the object. |
| priorityDate | 2014-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.