Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D23-1931 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32651 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D23-1951 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D23-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2020-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102089813-B1 |
titleOfInvention |
Controlling temperature of a faraday shield |
abstract |
A method for controlling thermal cycling of a faraday shield in a plasma process chamber is disclosed. The method comprises performing a first plasma processing operation on a first wafer in a plasma process chamber; Terminating the first plasma processing operation; Performing a first wafer transfer operation for transferring the first wafer to the outside of the chamber; And during the first wafer transfer operation, applying power to the TCP coil under plasma constrained conditions. |
priorityDate |
2013-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |