http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102079491-B1
Outgoing Links
Predicate | Object |
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classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1214 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66742 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-417 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
filingDate | 2017-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-102079491-B1 |
titleOfInvention | Method for manufacturing semiconductor device |
abstract | By reducing the number of exposure masks, one of the problems is to simplify the photolithography process and to produce a semiconductor device having an oxide semiconductor at low cost and with good productivity. A method of manufacturing a semiconductor device having an inverted staggered thin film transistor having a channel etch structure, wherein the oxide semiconductor film and the conductive film are etched using a mask layer formed by a multi-gradation mask, which is an exposure mask in which transmitted light has a plurality of intensities. The process is performed. The etching process uses dry etching by etching gas. [Index] Oxide Semiconductors, Channel Etching, Multi-Grade Masks, Dry Etching, Bottom Gates |
priorityDate | 2008-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 75.