http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102060961-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66742 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1214 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1225 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-417 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786 |
| filingDate | 2019-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102060961-B1 |
| titleOfInvention | Method for manufacturing semiconductor device |
| abstract | By reducing the number of exposure masks, one of the problems is to simplify the photolithography process and to produce a semiconductor device having an oxide semiconductor at low cost and with good productivity. A method of fabricating a semiconductor device having an inverted staggered thin film transistor having a channel etch structure, wherein the oxide semiconductor film and the conductive film are etched using a mask layer formed by a multi-gradation mask that is an exposure mask in which transmitted light has a plurality of intensities. The process is performed. The etching process uses dry etching by etching gas. [Index] Oxide Semiconductors, Channel Etching, Multi-Grade Masks, Dry Etching, Bottom Gates |
| priorityDate | 2008-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 51.