| abstract |
An etching solution composition comprising phosphoric acid and a silane compound represented by the following Chemical Formula 1. [Formula 1] In Formula 1, R 1 to R 6 are independently hydrogen, halogen, substituted or unsubstituted C1-C20 hydrocarbyl group, phenyl group, C1-C20 alkoxy group, carboxyl group, carbonyl group, nitro group, tri (C1- C20) alkylsilyl group, phosphoryl group or cyano group, L is a direct bond or C1-C3 hydrocarbylene, A is an n-valent radical, n is an integer of 1-4. |