http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102024568-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2245-42 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32366 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32348 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 2018-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-102024568-B1 |
| titleOfInvention | Point etching module using annular surface dielectric barrier discharge apparatus and method for control etching profile of point etching module |
| abstract | Disclosed is a point etching module using an annular surface discharge plasma apparatus. The point etching module using the annular surface discharge plasma apparatus includes a plate-shaped dielectric; A circular electrode disposed to be interviewed with an upper surface of the dielectric; An annular electrode disposed on the lower surface of the dielectric to provide a gas receiving space for receiving gas; And a power supply unit configured to apply a high voltage between the circular electrode and the annular electrode, and when a high voltage is applied and discharge is started, a plasma is developed between the inner surface of the annular electrode and the lower surface of the dielectric in the direction of the center of the annular electrode. The filamentous plasma is irradiated from the substrate to be processed. |
| priorityDate | 2018-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.