| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
2017-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2019-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-102008264-B1 |
| titleOfInvention |
Pattern formation methods |
| abstract |
A method of forming an electronic device includes: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer on the at least one layer to be patterned, the photoresist layer being formed from a composition comprising a matrix polymer comprising units having acid labile groups; a photoacid generator; and an organic solvent ); (c) coating the photoresist overcoat composition on the photoresist layer, wherein the overcoat composition comprises a matrix polymer; an additive polymer; a basic quencher; and an organic solvent; the additive polymer has a surface lower than the surface energy of the matrix polymer. Energy, and the additive polymer is present in the overcoat composition in an amount of 1 to 20 wt% based on the total solids of the overcoat composition); (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post exposure bake process; And (f) developing the exposed film with an organic solvent developer. The method has particular applicability in the semiconductor manufacturing industry. |
| priorityDate |
2014-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |