http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101993712-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2017-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101993712-B1 |
| titleOfInvention | Substrate treating apparatus, substrate treating method and plasma generating unit |
| abstract | The present invention relates to a substrate processing apparatus, a substrate processing method, and a plasma generating unit. A substrate processing apparatus according to an embodiment of the present invention includes a housing for providing a processing space in which a substrate is processed; A support unit for supporting the substrate in the processing space; A plasma generating unit disposed outside the chamber, the plasma generating unit exciting the plasma from the gas and supplying excited plasma to the processing space; And a controller, wherein the plasma generating unit includes: a plasma generating chamber having a space into which gas is introduced; A first antenna wound around the plasma generation chamber and connected to a power source through a conductor; A second antenna wound around the plasma generation chamber and connected to the power source through an auxiliary lead; And a switch for turning on / off the auxiliary lead. |
| priorityDate | 2017-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.