http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101931933-B1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-618
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F122-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-618
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C22-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 2012-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101931933-B1
titleOfInvention Compound, resin, photoresist composition and method for producing photoresist pattern
abstract The present invention relates to compounds of formula (I) Formula I In the above formula (I) T 1 is a single bond or a C6-C14 aromatic hydrocarbon group, L 1 is a C1-C17 divalent saturated hydrocarbon group, wherein the methylene group can be replaced by an oxygen atom or a carbonyl group, L 2 and L 3 are each independently a single bond or a C 1 -C 6 divalent saturated hydrocarbon group wherein the methylene group can be replaced by an oxygen atom or a carbonyl group, The ring W 1 and the ring W 2 are each independently a C 3 -C 36 hydrocarbon ring, R 1 and R 2 are each independently a hydrogen atom, a hydroxyl group or a C 1 -C 6 alkyl group, R 3 and R 4 are each independently a hydroxyl group or a C 1 -C 6 alkyl group, R 5 is a hydroxyl group or a methyl group, m is 0 or 1, t and u are each independently an integer of 0 to 2;
priorityDate 2011-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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