| abstract |
Resist composition, resist polymer, and resist capable of forming resist film having high sensitivity, high resolution, wide depth of focus margin, high light transmittance, few defects, and sufficient dry etching resistance Provided is a method for producing a substrate on which a fine pattern is formed using the composition. A resist polymer having a structural unit (A1) represented by the following formula (1-1) is used. [Chemical 1] [Selection figure] None |