http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101877646-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1606 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B32-20 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 2016-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101877646-B1 |
| titleOfInvention | Apparatus for etching thickness of black phosphorous |
| abstract | The present invention relates to a black phosphorus etching apparatus, wherein a black phosphorus etching apparatus according to the first embodiment of the present invention comprises a substrate 10 on which a black phosphorus piece 1 is fixed, a reaction chamber (not shown) 20), a support table (30) for supporting the substrate (10) so that the black pieces (1) are spaced from the bottom surface of the reaction chamber (20), a process gas (40) for producing volatile byproducts; And a plasma generator 50 for supplying plasma to the upper surface of the substrate 10 and for etching the black pieces 1 by plasma ion diffusion. |
| priorityDate | 2015-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.