http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101744608-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2012-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101744608-B1 |
| titleOfInvention | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition |
| abstract | It is an object of the present invention to provide a sensitizing actinic radiation-sensitive or radiation-sensitive resin composition capable of improving roughness characteristics and pattern collapse, and a sensitizing actinic ray or radiation-sensitive film and a pattern forming method using the same. (A) a resin which increases the solubility in an alkali developing solution by the action of an acid, and (C) a resin represented by the following general formula (ZI-3), general formula (ZI- 4) or a compound which generates an acid by irradiation with an actinic ray or radiation represented by the general formula (ZI-5), and the resin (A) is decomposed by the action of an acid At least one repeating unit having a group capable of eliminating a leaving group having a cyclic structure and having a cyclic structure having at least one of a polar group as a substituent and a polar atom as a part of the cyclic structure, Having a log P value of from 0 to less than 2.8. |
| priorityDate | 2011-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 374.