| abstract |
An object of the present invention is to provide a positive resist composition that solves the problems in the technology for improving the original performance of microphotofabrication using far ultraviolet light, particularly ArF excimer laser light, and more specifically. Provides a positive resist composition having excellent sidelobe margin characteristics. A resin containing a repeating unit derived from isosorbide (meth) acrylate, which increases the dissolution rate in an alkaline developer by the action of an acid, and generates an acid upon irradiation with a specific actinic ray or radiation having a naphthalene skeleton. A photosensitive composition containing a compound. [Selection figure] None |