http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101741910-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-04 |
| filingDate | 2015-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101741910-B1 |
| titleOfInvention | Photocurable resin composition containing modified graphene |
| abstract | The present invention relates to a photocurable resin composition comprising modified graphene (oxide) composed of 0.1 to 60 wt% of modified graphene (oxide), 0.05 to 15 wt% of photoinitiator, 1 to 60 wt% of monomers and 10 to 80 wt% The present invention relates to a composition, wherein a modified graphene (oxide) participates in a photopolymerization reaction and is chemically bonded to a monomer or an oligomer, whereby graphene is not diffused and discharged from the cured film even when used for a long period of time, And a modified graphene (oxide) having a high density and a high chemical resistance. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200137407-A |
| priorityDate | 2015-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 192.