| abstract |
The present invention relates to a process for producing an acid by reacting with a high energy ray selected from ultraviolet rays, far ultraviolet rays, electron beams, X-rays, excimer lasers,? -Rays and synchrotron radiation, Unit, a repeating unit having a lactone ring structure represented by the formula (2a) and / or (2b), and an oxyfuran stable unit represented by the formula (3), and both repeating units contain a hydroxyl group The present invention relates to a high molecular compound which does not react with water. The polymer compound of the present invention is useful as a base polymer for a positive resist material, and a positive resist material containing the above polymer compound can improve the pattern decay resistance while making the shape of the fine pattern rectangular. |